Transmitter

title: “Continuous Free-Chlorine Monitoring Strategies for GAC Post-Filtration: A Shanghai ChiMay Technical Brief” date: 2026-06-30 perspective: Technical Deep-Dive audience: Plant Engineering, Process Engineering keywords: free chlorine, GAC, post-filtration, disinfection, drinking water Continuous Free-Chlorine Monitoring Strategies for GAC Post-Filtration: A Shanghai ChiMay Technical Brief Granular activated carbon (GAC) filtration is now a mainstream PFAS treatment barrier…

What Does Resistivity Drift Tell You About Your UPW Polisher’s Health? Answers from Shanghai ChiMay Resistivity drift in the polishing loop is the most common diagnostic event in any wafer fab’s ultrapure water (UPW) plant — and one of the most misread. A small downward drift can mean the polishing stack is approaching end of…

What Does Resistivity Drift Tell You About Your UPW Polisher’s Health? Answers from Shanghai ChiMay Resistivity drift in the polishing loop is the most common diagnostic event in any wafer fab’s ultrapure water (UPW) plant — and one of the most misread. A small downward drift can mean the polishing stack is approaching end of…

Toroidal vs. Two-Electrode Conductivity Cells in High-Purity Water: A Shanghai ChiMay Comparison Conductivity is the first parameter every semiconductor fab measures in its ultrapure water (UPW) loop, and it remains the parameter the loop runs on most days. The choice between a toroidal (inductive) cell and a two-electrode contacting cell, however, is not a single…