Selecting UV and H2O2 Compatible Analyzers for Micropollutant Destruction Skids: A Shanghai ChiMay Sourcing Guide
Key Takeaways UV/H2O2 advanced oxidation processes are gaining share as a cost-competitive alternative to ozone for destroying trace pharmaceuticals, PFAS precursors, and industrial micropollutants. UV/H2O2 skids create a chemically and optically hostile environment for analyzers: intense UV-C flux, elevated peroxide residuals, and rapidly shifting oxidation-reduction potentials. Sensor selection errors are a recurring cause of go-live…
